活动简介
After the successful conferences in Nara, Japan (2012), Flagstaff, USA (2014) and Montpellier, France (2016), the 20th International Conference on Molecular Beam Epitaxy will take place in Shanghai, China.
The International Conference on Molecular Beam Epitaxy (ICMBE 2018) provides a prominent international forum for reporting new developments in the areas of fundamental and applied molecular beam epitaxy research, including advances in the technique, synthesis of new materials, discovery of new physical properties, formation of novel heterostructures, and the development of innovative devices.
组委会
Qian Gong Shanghai Institute of Microsystem and Information Technology, CAS, China
Yi Gu Shanghai Institute of Microsystem and Information Technology, CAS, China
Yi Huang Shanghai Institute of Microsystem and Information Technology, CAS, China
Xingyou Chen Shanghai Institute of Microsystem and Information Technology, CAS, China
Yingjie Ma Shanghai Institute of Microsystem and Information Technology, CAS, China
Chunfang Cao Shanghai Institute of Microsystem and Information Technology, CAS, China
Guixiang He Shanghai Institute of Microsystem and Information Technology, CAS, China
Jiannan Cao Shanghai Institute of Microsystem and Information Technology, CAS, China
征稿信息
全部留言
重要日期
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会议日期
09月02日
2018
至09月07日
2018
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09月07日 2018
注册截止日期
联系方式
- Prof. Qian Gong
- mb******@mail.sim.ac.cn
- +86*********
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